Metal Microstructure Microfabrication Technique

WU Ying,ZHOU Zhao-ying,XIANG Yi
DOI: https://doi.org/10.3969/j.issn.1002-1841.2006.01.004
2006-01-01
Abstract:The fabrication technique of three-dimensional microstructure is important in the MEMS microfabrication technology.The main methods of are silicon three-dimensional microfabrcaiton combining the SU-8 photoresist and IC process and LIGA-type microfabrcation.However,SU-8 microfabrciaon has limitation on the strip off process and the cost of LIGA-type is high.So,a new three-dimensional microfabrication technique for metal materials was developed from the silicon deep etching technique and electroplating technique.In the present research,a silicon mold with high aspect ratio microstructures was manufactured and metal micro structures were fabricated using this mold.A successful development of this technique opens a alternative way for three dimensional microfabrication techniques.
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