Abstract:Transparent conductive Al-doped ZnO (AZO) thin films were deposited on various substrates including glass, polyimide film (PI) and stainless steel, using radio frequency magnetron sputtering method. The structural, electrical and optical properties of AZO thin films grown on various substrates were systematically investigated. We observe that substrate materials play important roles in film crystallization and resistivity but little on optical transmittance. X-ray diffractometer study shows that all obtained AZO thin films have wurtzite phase with highly c-axis preferred orientation, and films on glass present the strongest (002) diffraction peaks. The presence of compression stress plays critical role in determining the crystalline structure of AZO films, which tends to stretch the lattice constant c and enlarge the (002) diffraction angle. Although the films on the glass present the finest electrical properties and the resistivity reaches 12.52 × 10-4 Ωm, AFM study manifests that films on flexible substrates, especially stainless steel, bestrew similar inverted pyramid structure which are suitable for window material and electrode of solar cells. The average optical transmittance of AZO thin films deposited on glass and PI are both around 85% in the visible light range (400–800 nm).

Preparation and Properties of AZO Thin Films on Different Substrates

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

The properties of Al doped ZnO thin films deposited on various substrate materials by RF magnetron sputtering

Effect of Al-doped on Optics and Electricity of ZnO (ZnO∶Al) Thin Films

The Growth and Characterization of AZO Films on Flexible Substrates

AZO (zno:Al) Transparent Conductive Film Prepared by Plasma Enhanced Chemical Vapour Deposition and Its Performances in Comparison with ZnO Film

Effect of Film Thickness on Properties of Al-Doped Zno Film As Transparent Conducting Electrodes in Oleds

Preparation of Aluminum Doped Zinc Oxide Films and the Study of Their Microstructure, Electrical and Optical Properties

Research on Preparation and Properties of Transparent Conductive ZnO:Al Thin films

Preparation and Characterization of Al-doped ZnO Films and the Properties of the Composite Films with Ferroelectric Films

Electro-Optical Property Of Plasma Enhanced Chemical Vapor Deposition Zno:Al Films Influenced By Substrate Materials And Annealing Treatments

Studies on Morphology, Electrical and Optical Characteristics of Al-doped ZnO Thin Films Grown by Atomic Layer Deposition

Structural ,Electrical ,and Optical Properties of Transparent Conductive Al-Doped ZnO Films Prepared by RF Magnetron Sputtering

Structural and Optoelectronic Properties of AZO Thin Films Prepared by RF Magnetron Sputtering at Room Temperature

High Performance AZO Thin Films Deposited by RF Magnetron Sputtering at Low Temperature

Optoelectronic effect of Al-based buffer layers on Al-doped ZnO thin transparent conductive films on flexible substrates

Preparation and characterization of high-transmittance AZO films using RF magnetron sputtering at room temperature

The Preparation of AZO Films with RF Sputtering

Characterization of AZO and Ag based films prepared by RF magnetron sputtering

Study on the structural, optic and electrical properties of transparent conductive ZnO:Al (ZAO) thin films

Study on Aluminum Concentration on Optical and Electrical Properties of AZO Thin Films Fabricated by Ultrasonic Spray Pyrolysis