Effect of Bias on Composition and Microstructure of Zr-Nb-N Diffusion Barrier

Xin Shao-guang,Song Zhong-xiao,Yang Yu-xue
2012-01-01
Abstract:The Zr-Nb-N diffusion barrier films were deposited at different bias by radio-frequency reaction magnetron sputtering.The effect of bais on the microstructure and electric properties of Zr-Nb-N thin films is analyzed by EDS,XRD,TEM and resistance tester,etc.The results show that the bias has an obvious effect on the composition,resistivity and microstructure of Zr-Nb-N thin films.With the increase of bias,Nb/Zr mole ratio increases and resistivity rises in advance then falls.The Zr-Nb-N thin films of single-phase nanocrystalline,with the microstructure of substitutional solid solution,can be obtained at the bias of-150 V.
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