Influence of Substrate Bias Voltage on (ti, Cr)N Films Fabricated by Vacuum Cathodic Arc Deposition

Fu Zhiqiang,Wang Chengbiao,Li Jinli,Yu Xiang,Peng Zhijian
2010-01-01
Abstract:The influence of substrate bias voltage on the surface defects, surface roughness, composition, deposition rate and hardness of (Ti, Cr)N thin films fabricated by vacuum cathodic arc deposition was studied by SEM, AFM and so on. It is found that with increase of the substrate bias voltage, the surface defects of (Ti, Cr)N films are restrained and the surface roughness of (Ti, Cr)N films is reduced. The deposition rates of (Ti, Cr)N films are reduced while the hardness of the (Ti, Cr)N films is increased when increasing the substrate bias voltage. However, the influence of the substrate bias voltage on the composition of (Ti, Cr)N films is not very obvious.
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