Heat-Transport in Micron Thick A-Si-H Films

DG CAHILL,M KATIYAR,JR ABELSON
DOI: https://doi.org/10.1080/01418639508238557
1995-01-01
Abstract:The thermal conductivity of a-Si:H thin films is determined in the temperature range 80-400 K in order to test recent theoretical calculations of heat transport in disordered harmonic solids. The hydrogen content of the a-Si:H films was varied from 1 to 20% using reactive magnetron sputtering and the data show little variation with hydrogen content. The low void fraction of these sputtered films and the phonon scattering provided by the film/substrate interface facilitate a quantitative comparison between experiment and theory. A simple extension of the theoretical calculation to include heat transport by long-wavelength phonons results in impressive agreement between experiment and theory.
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