Physical Modeling of Hole Mobility in Silicon Inversion Layers under Uniaxial Stress

Ji Zhao,Yaohua Tan,Jianping Zou,Zhiping Yu
DOI: https://doi.org/10.1007/s10825-006-0075-9
IF: 1.9828
2007-01-01
Journal of Computational Electronics
Abstract:A physical model for hole mobility under either biaxial or uniaxial stress has been developed. The six-band k ⋅ p theory is used to obtain the bandstructure through stress-dependent Hamiltonian. The hole mobility in the silicon inversion layer is studied in details using Monte Carlo method. A numerically robust method has been applied to achieve self-consistent solution of Poisson’s and Schrödinger equations.
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