Abstract:FeTiN films with good soft magnetic properties were prepared on Si and NaCl single-crystal substrates-by facing-targets sputtering (FTS). The effects of Ti addition on the structural and magnetic properties of Fe-N films were investigated. Ti has been found effective in improving the soft magnetic properties as well as the thermal stability of FeN films. For the films containing 5-12 at.% Ti prepared under sputtering conditions of pN(2) = 0.04-0.07 Pa, a substrate temperature of 100 degrees C, and a sputtering rate of 0.2 nm s(-1), the following properties are observed: very high saturation magnetization 4 pi M-s (2.3-2.5 T), low coercivity H-c (160-240 A m(-1)), and high relative permeability mu (3000-3500 at 1 MHz). The thermal stability of these films was also found to be good, e.g. H-c was less than 240 A m(-1) and 4 pi M-s was higher than 2.3 T for the films annealed up to 500 degrees C. The crystal structures of the FeTiN films were examined with an x-ray diffractometer and a transmission electron microscope. Ti addition affects the formation of magnetic iron nitride phases and makes the crystallites small. The fine-grained Fe-N phase, together with finely dispersed TiN precipitates, is considered to be one of the main factors responsible for the good magnetic properties and thermal stability.

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