Effect of Ni Concentration on the Structure and Magnetic Properties for Nanocrystalline Fe–Ni–N Thin Films
L. L. Wang,W. T. Zheng,T. An,N. Ma,J. Gong
DOI: https://doi.org/10.1016/j.jallcom.2010.01.146
IF: 6.2
2010-01-01
Journal of Alloys and Compounds
Abstract:Nanocrystalline γ′-(Fe1−xNix)4N (x=0.05–0.50) thin films were synthesized on single crystal Si(100) substrates by facing target (Fe and Ni) magnetron sputtering at a mixture of Ar/N2 gas discharge, and their Fe/Ni atomic ratio, structure, morphology, and magnetic properties at room temperature were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), and vibrating sample magnetometer (VSM). The sputtering current for Ni target was fixed at 0.02, 0.04, 0.06, 0.08, 0.10 and 0.15A, respectively, upon keeping the sputtering power for Fe target constant at 36W (I=0.10A, U=360V). Via optimizing Ni concentration through varying sputtering current for Ni target, the structural stability and the soft magnetic properties for the films were improved effectively. As the Ni concentration for the films increased, their lattice parameters and saturation magnetization Ms decreased, while grain sizes increased. The coercive force Hc for the films decreased from 66 to 36Oe as the Ni concentration increased from 0.05 to 0.36, but increased to 76Oe with a further increase in Ni concentration up to 0.50.