Films with High Saturation Magnetization Prepared by Facing Target Sputtering

HY Wang,EY Jiang

DOI: https://doi.org/10.1088/0953-8984/9/40/020

1997-01-01

Journal of Physics Condensed Matter

Abstract:FeCoN films with 10 at.% Co content were prepared by facing target sputtering. The effect of in situ annealing and post-deposition annealing on the structure and magnetic property of FeCoN films was investigated. The phases formed in FeCoN films are strongly dependent on the thermal treatment process. Growth at , followed by annealing at this temperature, yields the formation of phase, and post-deposition annealing, at 150 and , of films grown at room temperature (RT) yields the formation of phase. The film grown at RT followed by annealing at exhibits a high saturation magnetization up to 2.7 T. The saturation magnetization of alloy phase is expected to be 2.8 - 2.9 T, which is as large as that of reported by Sugita et al, and this indicates that appropriate Co addition is not likely to reduce the high magnetization of the alloy phase.