Fabrication and Characterization of Self-Standing W-Nanodendrites on Insulator Sio2 Substrate by Electron-Beam-Induced Deposition under Hvtem

GQ Xie,MH Song,K Mitsuishi,K Furuya
DOI: https://doi.org/10.1143/jjap.44.5654
IF: 1.5
2005-01-01
Japanese Journal of Applied Physics
Abstract:Self-standing W-nanodendrite structures were fabricated on an insulator SiO2 substrate by electron-beam-induced deposition under a 1000kV high-voltage transmission electron microscope (HVTEM). The growth process and as-fabricated structures were characterized by conventional and high-resolution transmission electron microscopies (CTEM and HRTEM) and X-ray energy dispersive spectroscopy (EDS). The nucleation and growth of nanodendrite structures are attributed to a mechanism involving charge-up produced on the substrate surface, and the movement of charges to and charge accumulation at the convex surface of the substrate as well as the tips of the deposits. The as-fabricated nanodendrite structures possess a high crystallinity and a high content of tungsten. The structures consist of many nanometer-scale body-centered cubic (bcc) W crystals.
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