Numerical Simulation on SITH's Negative-Resistance Transition

YANG Jun,JIANG Meng-heng,YANG Ding-yu,TU Xiao-qiang
DOI: https://doi.org/10.3969/j.issn.1003-2843.2006.05.040
2006-01-01
Abstract:According to the Drift-Diffusion model in the semiconductor simulation,the simulation and analysis are preserved for negative resistance of sith.By simulating the voltage and carrier distribution inside the device,the simulation result demonstrates that the enhanced both-injection of carrier and the shrink away of depletion region brings the negative resistance to the device.The result fits together with the experimental data and it's significant for the design and optimization of device.
What problem does this paper attempt to address?