Channel Doping Effects in Negative Capacitance Field-Effect Transistors

Baoliang Liu,Xiaoqing Huang,Yanxin Jiao,Ning Feng,Xuhui Chen,Zhao Rong,Xinnan Lin,Lining Zhang,Xiaole Cui
DOI: https://doi.org/10.1016/j.sse.2021.108181
IF: 1.916
2021-01-01
Solid-State Electronics
Abstract:The channel doping effects in negative capacitance field-effect transistors (NCFETs) of the metal-ferroelectric-insulator-semiconductor (MFIS) structure are analysed in this work, and an analytical model is developed. The NCFET threshold voltage with channel doping is defined, and a nonmonotonic dependence on the doping concentrations is predicted. A unified charge formulation is developed for the current-voltage characteristics of double gate MFIS structures. Statistical modelling for NCFETs is further developed. Standard deviations of four parameters are extracted, reproducing the distributions of NCFET current-voltage characteristics. Experimental calibrated TCAD simulations validate the analytical model for wide ranges of device parameters, allowing its application to devices and circuits.
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