Abstract:Al-doped ZnO (AZO) films were prepared on glass substrates by RF magnetron sputtering in an Ar?+?5%H2 ambient at room temperature. The influence of film thickness (851101?nm) on the structural, electrical, and optical properties of the films was investigated. With increasing film thickness, it is found that the crystallinity of the films is improved and the surface roughness of the films increases. The decrease of resistivity is accompanied by an increase of carrier concentration and mobility. At the film thickness of 5831101?nm, larger figures of merit (FOM) of the films can be obtained, in which the film with a thickness of 803?nm has the lowest resistivity of 3.13 x 10(-4)?O?cm, a sheet resistance of 3.90?O/sq, and an average optical transmittance in the visible range of 80%. With increasing film thickness, the crystallite size, carrier concentration, and mobility of the films increase simultaneously, implying that the main scattering mechanism is the intercrystallite boundary scattering. It is found that the optical bandgap (Eg) increases from 3.50 to 3.72?eV with film thickness, and this increase can be ascribed to the BursteinMoss (BM) effect after considering all possible effect factors. The results demonstrate that AZO films deposited in an Ar?+?H2 atmosphere at room temperature are suitable for application in thin-film solar cells as transparent conductive electrode layers.

Effect of Film Thickness on Properties of AZO Films Prepared by DC Magnetron Sputtering

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Fabrication and Properties of Transparent Conductive AZO/Cu Bilayer Films

Effect of Film Thickness on Properties of Al-Doped Zno Film As Transparent Conducting Electrodes in Oleds

Effect of the ZnO buffer layer thickness on AZO film properties

Structural and Optoelectronic Properties of AZO Thin Films Prepared by RF Magnetron Sputtering at Room Temperature

High Performance AZO Thin Films Deposited by RF Magnetron Sputtering at Low Temperature

Thickness Study of AZO Films by RF Sputtering in Ar + H2 Atmosphere at Room Temperature

Research on Preparation and Properties of Transparent Conductive ZnO:Al Thin films

Effects of deposition power and pressure on the crystallinity of Al-doped ZnO thin films at glass substrates by low temperature RF magnetron sputtering

Properties of transparent conductive ZnO:Al thin films prepared by magnetron sputtering

Preparation and characterization of high-transmittance AZO films using RF magnetron sputtering at room temperature

Effects of DC Sputtering Power on the Properties of AZO Films Deposited at Room Temperature for CIGS Photovoltaics

Effect of film thickness on surface morphology and optical properties of nanostructured Zinc Aluminum Oxide thin films deposited by DC magnetron sputtering

Effect of film thickness on electrical and optical properties of ZnO/Ag dual layer film

Micrographs and Optical Properties of Al-Doped Zno Thin Films Deposited by Radio Frequency Magnetron Sputtering

Transparent conductive and near-infrared reflective Cu-based Al-doped ZnO multilayer films grown by magnetron sputtering at room temperature

Properties and preparation of ZAO/metal/ZAO transparent conducive multilayer films

Influence of Deposition Temperature on the Crystallinity of Al-doped ZnO Thin Films at Glass Substrates Prepared by RF Magnetron Sputtering Method

Transparent conductive Al-doped ZnO/Cu bilayer films grown on polymer substrates at room temperature

Characterization of AZO and Ag based films prepared by RF magnetron sputtering