Characteristics of GaN Based Laser Diode

张立群,张书明,江德生,朱建军,赵德刚,杨辉
DOI: https://doi.org/10.3969/j.issn.1007-2276.2009.01.009
2009-01-01
Abstract:GaN based laser diodes are widely used in many fields. One of the difficulties of fabricating GaN based laser diodes on sapphire substrate is facets cleaving. Based on the analysis of cleavage planes and comparison between facet images of laser diodes and different substrate thickness, it was found that the facet roughness could be reduced by thinning the substrate. Mirror like facets were obtained when the wafer was thinned with a thickness of 50 μm. It was demonstrated by devices measurement that the reduction of facet roughness could reduce the threshold current and enhance the slope efficiency greatly. The influences of ridge height on optical confinement factor and far-filed pattern (FFP) were investigated by two-dimensional optical waveguide simulation. The simulation results indicate that increasing ridge height can increase the optical confinement factor and reduce the FFP aspect ratio. Laser diodes with different ridge heights are fabricated and the simulation results are demonstrated by devices measurement results.
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