Line Edge Roughness and Top-bottom-surface Roughness Measurement of Single-crystal-silicon Step Using AFM

LI Hong-bo,ZHAO Xue-zeng
DOI: https://doi.org/10.3969/j.issn.1005-9830.2007.04.018
2007-01-01
Abstract:Single side topography on the single-crystal-silicon step is measured by AFM(atomic force microscope) in top-down mode.The way to verify the nonlinearity of the piezoelectric actuator in AFM is proposed: to regard the mean height of the 5 lowest points in each scan-line as the height reference point,and the reference points' height of all scan-lines are equivalent to each other.Based on this,the nonlinearity of the piezoelectric actuator of AFM is verified.The edge,top and bottom surface range of the sample are determined respectively by using the NIST(National Institute of Standards and Technology) height-algorithm integrated with histogram.The root mean square(RMS) and the power spectral density(PSD) of each scan-line roughness on the top-bottom-surfaces are the same.As for the line edge roughness,RMS decreases when the height increases,while,the dominant frequency range of PSD slightly reduces when the height increases,but this change is inconspicuous.
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