Abstract:Titanium dioxide films were deposited on silicon substrates from oxygen/titanium tetraisopropoxide inductively coupled radiofrequency plasmas in a helicon reactor operated at low temperature (<150°C) and low pressure (0.4Pa). The effect of the ion energy (Ei), varied in the 15–175eV range, on the morphology, microstructure and optical properties of the films is investigated. Scanning electron microscopy (SEM) shows that at low energy (Ei=15eV), the film exhibits a columnar morphology consisting of a bottom dense layer, an intermediate gradient layer and a top roughness layer. Increasing the ion energy results in more homogeneous films along the growth direction as confirmed by the in-situ kinetic ellipsometry measurements and post deposition spectroscopic ellipsometry data analysis. In addition, the atomic force microscopy (AFM) measurements reveal that the film top surface becomes smoother as Ei is increased. X-ray diffraction (XRD) diagrams show that only anatase is identified in the film deposited at 15eV, whereas the complete phase transformation from anatase to rutile occurs at Ei=75eV. These results are in good agreement with the Fourier transform infrared spectroscopy (FTIR) spectra which also show that the hydroxyl groups absorbed in the films deposited at 15eV, are greatly decreased for Ei≥45eV. Suitable structural models combined with the Tauc–Lorentz dispersion law have been found to accurately fit the spectroscopic ellipsometry experimental data. The results in good agreement with SEM and AFM measurements are also consistent with the structural properties evidenced by XRD and FTIR. The refractive index (n) can be increased significantly by increasing the ion energy from 15eV to 75eV, reaching a value of 2.49 at 1.96eV. Upon increasing the ion energy above 75eV n is shown to decrease due to micropores which are formed in the films.

Highly Oriented Rutile-Type Tio2 Films Synthesized by Ion Beam Enhanced Deposition

Effect of Xe+ Bombardment on the Formation of Highly Oriented Rutile-Type Titanium Oxide Films

TiO2−x Films Prepared by Ion Beam Assisted Deposition

Study On The Effect Of Ion Beam Bombardment During Deposition On Preferred Orientation In Rutile-Type Titanium Dioxide Films

Structure and Properties of Tio2 Films Prepared by Ion Beam Assisted Deposition

Rutile-Type Titanium Oxide Films Synthesized by Filtered Arc Deposition

Structural Characteristics of Rutile Films Prepared by Direct Deposition and Neon Ion Beam Assisted Deposition

Formation Of Nanocrystalline Tin Film By Ion-Beam-Enhanced Deposition

Crystallization Behaviors of TiO2 Films Derived from Thermal Oxidation of Evaporated and Sputtered Titanium Films

Chemical Composition and Structure of Titanium Oxide Films Deposited on LTI-carbon by IBED

Structural and Dielectric Properties of Ion Beam Deposited Titanium Oxynitride Thin Films

TiO2 films prepared by DC reactive magnetron sputtering at room temperature: Phase control and photocatalytic properties

Electronic Structures of Titanium Oxide Films Grown by Dynamic Ion Beam Mixing

Effect of ion bombardment on the structural and optical properties of TiO 2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma

Influence of IBED Parameters on the Composition and Structure of Titanium Oxide Films Deposited on LTI-carbon

Anatase Tio2 Films with Dominant {001} Facets Fabricated by Direct-Current Reactive Magnetron Sputtering at Room Temperature: Oxygen Defects and Enhanced Visible-Light Photocatalytic Behaviors

Preparation of Highly Oriented Titania Nanosheet Thin Films by Electrophoretic Deposition

Structure and Optical Properties of TiO2 Thin Film Deposited by Ion Beam Assistant Reactive Electron Beam Evaporation

Influence of Substrate on Structural, Morphological and Optical Properties of TiO2 Thin Films Deposited by Reaction Magnetron Sputtering

Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering

X-ray Photoelectron Spectroscopy Characterization of TiO2 Films Deposited by Dynamic Ion Beam Mixing