Three Dimensional Interconnect Stress Modeling for Back End Process

Xiaopeng Xu,Victor Moroz
DOI: https://doi.org/10.1557/PROC-812-F6.25
2003-01-01
Abstract:A process oriented approach is demonstrated for modeling the stress evolution during the entire back end process flow. No ad hoc assumptions regarding stress states are made for layer deposition and etching. Intrinsic stresses from material formation, thermal mismatch stresses from temperature ramps, stress relaxation due to viscous deformation, and stress profile redistribution upon deposition and etching are all considered at each process. Parametric studies are carried out to examine the effects of viscous flow, material selection and layout variations. It is found that the viscous flow of the passivation and dielectric materials have large impact on stress evolution. A TCAD assisted design approach is suggested for lowering stress levels of critical stress components. The implications of the stress modeling results on reliability issues like stress-triggered void formation are discussed.
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