Double layer antireflection coating for high-efficiency passivated emitter silicon solar cells

Jianhua Zhao,Aihua Wang,M. A. Green

DOI: https://doi.org/10.1109/16.310110

IF: 3.1

1994-01-01

IEEE Transactions on Electron Devices

Abstract:Recent high-efficiency silicon solar cells employ high-quality oxides both for surface passivation and as a rudimentary antireflection coating. This gives over 3% reflection at the cell front surface, even though the surface is microstructured. A double layer antireflection coating applied to cells with reduced SiO2 thickness reduces the cell reflection. However, although reflection is minimized by reducing the oxide thickness to values below 100 angstrom, a rapid falloff in both open-circuit voltage and short-circuit current is observed experimentally once this thickness is reduced below 200 angstrom. The best compromise is found when oxide thickness is 250 angstrom which allows improved short-circuit current density without appreciable loss in open-circuit voltage.