Study on the Third-Order Nonlinear Enhancement of SiN Films

Song Jiangting,Guo Hengqun,Wang Jiaxian,Wu Zhijun,Wang Guoli,Shen Haibo,Xu Jun,Chen Kunji,Wang Qiming
DOI: https://doi.org/10.3969/j.issn.1003-353x.2009.05.006
2009-01-01
Abstract:The silicon nitride (ncSi-SiNx) composite films with nanocrystal-Si-particle were prepared by RF magnetron reaction sputtering technique and thermal annealing.The composition,structure and optical band gap of the films were characterized by energy dispersive spectrometer (EDS) and X-ray diffraction(XRD).The nonlinear optical properties of ncSi-SiNx composite films were investigated by using single beam Z-scan technique with a picosecond pulses laser.The measured third-order nonlinear optical refractive index and nonlinear absorption coefficient are enhanced and estimated to be on the order of 10-8 esu and 10-8 m/W respectively.This is due to the quantum confinement effect.
What problem does this paper attempt to address?