Large array of single, site-controlled InAs quantum dots fabricated by UV-nanoimprint lithography and molecular beam epitaxy
A Schramm,J Tommila,C Strelow,T V Hakkarainen,A Tukiainen,M Dumitrescu,A Mews,T Kipp,M Guina
DOI: https://doi.org/10.1088/0957-4484/23/17/175701
IF: 3.5
2012-04-05
Nanotechnology
Abstract:We present the growth of single, site-controlled InAs quantum dots on GaAs templates using UV-nanoimprint lithography and molecular beam epitaxy. A large quantum dot array with a period of 1.5 µm was achieved. Single quantum dots were studied by steady-state and time-resolved micro-photoluminescence experiments. We obtained single exciton emission with a linewidth of 45 µeV. In time-resolved experiments, we observed decay times of about 670 ps. Our results underline the potential of nanoimprint lithography and molecular beam epitaxy to create large-scale, single quantum dot arrays.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology