Pulsed Laser Deposited Ba(Mg1/3Ta2/3)O3 Microwave Dielectric Thin Films

YH Chu,SJ Lin,KS Liu,IN Lin
DOI: https://doi.org/10.1080/10584580390259344
2003-01-01
Integrated Ferroelectrics
Abstract:Ba(Mg-1/3 Ta-2/3)O-3 (BMT) microwave dielectric thin films were successfully synthesized by a modified pulsed laser deposition (PLD) process, which includes low temperature (200degreesC) deposition and high temperature (>500degreesC) annealing. Crystalline structured BMT thin films were obtained when the PLD-deposited films were post-annealed at a temperature higher than 500degreesC in oxygen atmosphere. The characteristics of BMT thin film, including crystallinity, grain size, film roughness, and dielectric properties were improved with annealing temperature, achieving dielectric constant K = 23.5 and dissipation factor tan delta = 0.015 (at 1 MHz) for the 800degreesC-annealed films.
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