Abstract:Photonic technology, using light instead of electrons as the information carrier, is increasingly replacing electronics in communication and information management systems. Microscopic light manipulation, for this purpose, is achievable through photonic bandgap materials, a special class of photonic crystals in which three-dimensional, periodic dielectric constant variations controllably prohibit electromagnetic propagation throughout a specified frequency band. This can result in the localization of photons, thus providing a mechanism for controlling and inhibiting spontaneous light emission that can be exploited for photonic device fabrication. In fact, carefully engineered line defects could act as waveguides connecting photonic devices in all-optical microchips, and infiltration of the photonic material with suitable liquid crystals might produce photonic bandgap structures (and hence light-flow patterns) fully tunable by an externally applied voltage. However, the realization of this technology requires a strategy for the efficient synthesis of high-quality, large-scale photonic crystals with photonic bandgaps at micrometre and sub-micrometre wavelengths, and with rationally designed line and point defects for optical circuitry. Here we describe single crystals of silicon inverse opal with a complete three-dimensional photonic bandgap centred on 1.46 microm, produced by growing silicon inside the voids of an opal template of dose-packed silica spheres that are connected by small 'necks' formed during sintering, followed by removal of the silica template. The synthesis method is simple and inexpensive, yielding photonic crystals of pure silicon that are easily integrated with existing silicon-based microelectronics.

Fabrication of Silicon Inverse Opal Photonic Crystal with A Complete Photonic Band Gap in Mid Infrared Range and Its Optical Properties

Large-scale synthesis of a silicon photonic crystal with a complete three-dimensional bandgap near 1.5 micrometres

Omnidirectional Photonic Crystal Reflector Used in Ultraviolet Region

Fabrication and Characterization of Monolithic 3D Amorphous Silicon Inverse-opal Photonic Materials with Magnesiothermic Reduction at a Lower Temperature

Size-Dependent Optical Absorption of Silicon Nanocrystals Embedded in Sio2/Si3n4 Hybrid Matrix

Optical Characterisation of Silicon Nanocrystals Embedded in SiO2/Si3N4 Hybrid Matrix for Third Generation Photovoltaics.

Fabrication and performance of a medium-dependent SiO_2/Si photonic heterostructure device

A Polycrystalline SiO2 Colloidal Crystal Film with Ultra-Narrow Reflections

Study on silica inverse opal photonic crystal on polyester fabrics and its structure

The polarization modulation and fabrication method of two dimensional silica photonic crystals based on UV nanoimprint lithography and hot imprint

Silica Photonic Crystals with Quasi-Full Band Gap in the Visible Region Prepared in Ethanol *

Fabrication of a Reflective Mirror Within Wide Incidence Angles for Mid-Infrared Wavelength

1D partially oxidized porous silicon photonic crystal reflector for mid-infrared application

Study of Silicon-on-glass Waveguides

Photonic Properties of Silicon-On-Glass Nano-Films and Its Fabrication

Fabricate Photonic Crystals Based on ZnS/opal System Via Solvothermal Method

Optimization Design and Fabrication of Photonic Crystal Waveguides Based on Soi Using 248-Nm Deep-Uv Lithography

Two-Dimensional Silicon Photonic Crystal Slab Devices

Physical and Optical Properties of Silica/Polymer Nanocomposite Inverse Opal

Thermally Tuning of the Photonic Band Gap of SiO2 Colloid Crystal Infilled with Ferroelectric BaTiO3

Silicon Integrated Bi2TbFe5O12 Thin Films for O-band Nonreciprocal Photonic Device Applications