Electrical conductivity behaviour of thin in situ phosphorus doped VLPCVD polysilicon films

M. Mokhtari,B. Fortin,O. Bonnaud,A. Liba,M. Sarret
DOI: https://doi.org/10.1016/0254-0584(93)90106-V
IF: 4.778
1993-01-01
Materials Chemistry and Physics
Abstract:The doped polysilicon layers were grown on glass substrates by thermal decomposition of silane at very low pressure with phosphine as doping gas. The doping concentration variations were obtained in the range 1018 cm−3 to 1020 cm−3 by varying the phosphine/silane mole ratio. Electrical conductivity variations as function of temperature were studied in the range 90–570 K for 6 samples doped at several levels. The measured conductivity at room temperature varies from 2 to 400 S cm−1. Whatever the temperature is, the conductivity increases with doping level. Whatever the doping level is, this conductivity is thermally activated beyond room temperature; at low temperature, the preponderant conduction mechanism is the tunneling through grain boundary barriers.
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