The Effect of Film Thickness on the Electrical Properties of LPCVD Polysilicon Films

N. C. C. Lu
DOI: https://doi.org/10.1149/1.2115724
IF: 3.9
1984-01-01
Journal of The Electrochemical Society
Abstract:The effect of film thickness on the electrical properties of boron‐doped LPCVD polysilicon films with doping concentration ranging from 1×1017 to 1×1019 cm−3 has been characterized from 1.2 μm down to 0.1 μm. The resistivity increases exponentially as the film thickness decreases, rather than remaining constant, and the rate of increase is a strong function of doping concentration. After a quantitative study on the physical mechanisms which can affect the resistivity as film thickness decreases, the carrier trapping effect due to grain‐size variation at different film thicknesses is shown to be the dominant factor. A trapping model without assuming the depletion approximation can explain well the experimental data and enhances understanding of the resistivity behavior as the polysilicon film thickness decreases.
electrochemistry,materials science, coatings & films
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