Fabrication and characterization of high extinction ratio transmission polarizers

Zhen-Cheng Xu,Shen-Qi Xie,Zhen Shu,Bing-Rui Lu,Jing Wan,Yifang Chen,Ejaz Huq,Xin-Ping Qu,Ran Liu
DOI: https://doi.org/10.1016/j.mee.2009.11.111
IF: 2.3
2010-01-01
Microelectronic Engineering
Abstract:In this paper, large area nanoimprint lithography on a trilayer resist stack for the nanofabrication of light polarizer was successfully carried out. Large area gratings with 10mmx10mm area and 300nm pitch were fabricated. The measurement results indicate that our polarizers exhibit extraordinarily high extinction ratio. It is observed that the extinction ratio is dependent on the wavelength. Theoretical simulation also agreed with our measured results very well. The poor reflective polarization property measured in this work was discussed.
What problem does this paper attempt to address?