Fabrication and characterization of high extinction ratio transmission polarizers

XuZhen-Cheng,XieShen-Qi,ShuZhen,LuBing-Rui,WanJing,ChenYifang,HuqEjaz,QuXin-Ping,LiuRan

IF: 2.3

2010-01-01

Microelectronic Engineering

Abstract:In this paper, large area nanoimprint lithography on a trilayer resist stack for the nanofabrication of light polarizer was successfully carried out. Large area gratings with 10mmx10mm area and 300...

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Fabrication and characterization of high extinction ratio transmission polarizers

Zhen-Cheng Xu,Shen-Qi Xie,Zhen Shu,Bing-Rui Lu,Jing Wan,Yifang Chen,Ejaz Huq,Xin-Ping Qu,Ran Liu

DOI: https://doi.org/10.1016/j.mee.2009.11.111

IF: 2.3

2010-01-01

Microelectronic Engineering

Abstract:In this paper, large area nanoimprint lithography on a trilayer resist stack for the nanofabrication of light polarizer was successfully carried out. Large area gratings with 10mmx10mm area and 300nm pitch were fabricated. The measurement results indicate that our polarizers exhibit extraordinarily high extinction ratio. It is observed that the extinction ratio is dependent on the wavelength. Theoretical simulation also agreed with our measured results very well. The poor reflective polarization property measured in this work was discussed.
An Integrated Surface Plasmonic TE-Pass Polarizer on a Silica-on-Silicon Waveguide

Heliang Shen,Xuan She,Fei Huang,Wen Fan,Hongshuo Liu,Kan Chen,Ran Bi,Lei Wang,Xiaowu Shu

DOI: https://doi.org/10.1109/lpt.2024.3351698

IF: 2.6

2024-01-01

IEEE Photonics Technology Letters

Abstract:We report an integrated implementation of a surface plasmonic TE-pass polarizer on a silica-on-silicon waveguide. The effect of waveguide width and length on polarization extinction ratio (PER) were investigated. For a 10 mm device, PER in excess of 48 dB with TE mode loss of approximately 0.8 dB was recorded. In addition, we experimentally demonstrate a wavelength dependence of PER smaller than 3 dB with a width of 5.5- 6.5 mu m device over the C band from 1520-1580 nm. We also present a theoretical analysis and numerical simulation of this architecture that are in good agreement with each other and the experimental results. By improving the fabrication process and PER measurement method, over 60 dB PER and less 0.1 dB TE mode loss can be obtained for a 10 mm polarizer according to our model, which is expected to be widely applicated in sensors such as optical gyroscopes.
Fabrication and Characterization of Bilayer Metal Wire-Grid Polarizer Using Nanoimprint Lithography on Flexible Plastic Substrate

Fantao Meng,Gang Luo,Ivan Maximov,Lars Montelius,Jinkui Chu,Hongqi Xu

DOI: https://doi.org/10.1016/j.mee.2011.06.008

IF: 2.3

2011-01-01

Microelectronic Engineering

Abstract:In this work, we demonstrate the fabrication of bilayer metal wire-grid polarizers and the characterization of their performance. The polarizers with 200nm period were fabricated on flexible plastic substrates by nanoimprint lithography (NIL), followed by aluminum deposition. Transmission efficiency over 0.51 and extinction ratio higher than 950 can be achieved in the visible range when the aluminum thickness of the polarizer is 100nm. The fabrication process only involves direct imprinting on flexible plastic substrates and aluminum deposition, without any resist spin-coating, lift-off, and etching processes, which is much simpler, less costly, and applicable to large volume production.
Design and Fabrication of a TE-pass Polarizer Based on Silicon Nitride Optical Waveguide

Siyang Zhou,Zhongwen Wang,Jian-Jun He

DOI: https://doi.org/10.1117/12.2656995

2022-01-01

Abstract:An on-chip TE-pass polarizer working near 850nm band is designed and fabricated on silicon nitride platform. The structure is very simple, using a straight silicon nitride waveguide separated from a metal strip by a low index silicon oxide spacer layer. By optimizing the thickness of the spacer layer, the metal strip introduces more loss for TM mode than TE mode. The measured extinction ratio of the fabricated device is around 20dB over a 16nm wavelength range from 837nm to 853nm for a 3mm-long polarizer.
A Study of Nano-Structural Effect on the Polarization Characteristics of Metallic Sub-Wavelength Grating Polarizers in Visible Wavelengths

Zongyao Yang,Bo Feng,Bingrui Lu,Yifang Chen,Wenhao Li,Wei Zhang,Tao Li

DOI: https://doi.org/10.1016/j.mee.2020.111327

IF: 2.3

2020-01-01

Microelectronic Engineering

Abstract:The structural effect of subwavelength gratings as the polarizer on the polarization characteristics in visible wavelengths (400-700 nm) is systematically investigated through both numerical simulation with Finite Difference Time Doman algorithm and experiments. The grating parameters such as the material, the pitch, the duty cycle, the height and the cross-sectional shape of the grating are addressed in this work. The optimized range for those parameters is worked out, based on the desired performance margin at the level of 70% transmittance and 50:1 for the extinction ratio. Polarization performance such as the transmittance over 70% and the extinction ratio above 50:1 has been experimentally demonstrated by the 200 nm pitched grating in Al with the height of 150 nm, which was fabricated by high resolution electron beam lithography in this work, guided by the simulation result. Au grating as the polarizer was also compared but ruled out in this work because of the poor performance in polarization. This work is essential in developing grating based polarizers for polarimetric detection and imaging in visible wavelengths.
Optimization Study of Metallic Sub-Wavelength Gratings As the Polarizer in Infrared Wavelengths.

Zongyao Yang,Bo Feng,Bingrui Lu,Yifang Chen,Wenhao Li,Wei Zhang,Tao Li

DOI: https://doi.org/10.1364/ao.378636

IF: 1.9

2020-01-01

Applied Optics

Abstract:Despite the polarimetric detection in the infrared wavelengths of 8-10 µm being of great importance and broad applications, there has been limited addressing of the grating-based polarizers in this band. One of the main issues lies in the process incompatibility between the conventional nanofabrication technique and the II-VI materials such as HgCdTe, so that the direct integration of polarizers with sensors still remains a big challenge. This paper reports our recent work on optimizing the grating structures, materials, and nanofabrication processes for enhancing both the transmittance and the extinction ratio of polarizers on Si and/or ZnSe wafers, using numerical simulations for the grating design and electron beam lithography for the nanoscale pattern generation. By utilizing the finite-difference time-domain method, both the transmittance and the extinction ratio are maximized by optimizing the grating geometric dimensions and the duty cycle for two different grating materials of Al and Au for comparison. Based on the designed structures, nanofabrications of sub-wavelength gratings in both Al and Au are carried out, and the processes are compared for achieving high polarization performance. Optical characterizations of the fabricated polarizers demonstrate that both high transmittance and extinction ratio can be achieved in feasible parameters and the nano-process developed in this work.
Broadband and Compact TE-Pass Polarizer Based on Hybrid Plasmonic Grating on LNOI Platform

Shuangxing Dai,Wenqi Yu,Yiru Zhao,Mingxuan Li,Jinye Li,Zhike Zhang,Jianguo Liu

DOI: https://doi.org/10.1109/JPHOT.2020.3041286

IF: 2.4

2021-01-01

IEEE Photonics Journal

Abstract:A broadband and compact TE-pass/TM-stop polarizer is presented based on hybrid plasmonic grating (HPG) on an x-cut Lithium-Niobate-on-isolator (LNOI) platform. By comprehensively analyzing the effects of metal width on mode effective index, mode similarity, and mode conversion, we demonstrate the structure with a narrow metal layer. The simulation results indicate that the polarizer with a compact length of 9 mu m achieves an extinction ratio over 20 dB within the wavelength range from 1470 nm to 1700 nm. The insertion loss is below 2.3 dB in C-band. Furthermore, the polarizer exhibits large fabrication tolerance to current fabrication technology.
Fabrication of Polarization Independent Gratings Made on Multilayer Dielectric Thin Film Substrates

Shen Biyao,Zeng Lijiang,Li Lifeng,Yan Hong

DOI: https://doi.org/10.11884/hplpb201527.111013

2015-01-01

High Power Laser and Particle Beams

Abstract:We briefly present design parameters and fabrication procedures of polarization independent gratings made on multilayer dielectric thin film substrates for spectral beam combining applications. In the wavelength range of 1.044 m to 1.084 m the -1st Littrow order average diffraction efficiencies of TE polarization and TM polarization are 89.7% and 93.8% respectively.
Development and analysis of a nano-triangular wave-shaped polarizer

Ryohei Hokari,Kyohei Takakuwa,Kengo Shiomoto,Genki Kuwano,Kazuma Kurihara

DOI: https://doi.org/10.1038/s41598-023-40511-z

2023-08-17

Abstract:As society becomes smarter, advanced optical sensing and imaging technologies utilizing visible and near-infrared regions have become increasingly prevalent. Wire-grid polarizers, which are available for broadband electromagnetic waves, are effective in improving the signal-to-noise ratio of such optical systems and enabling more advanced object detection and analysis. However, to be implemented in everyday products, low-cost manufacturing methods must be developed while maintaining high-performance optical functions. To meet these requirements, we conducted an analysis of the geometry of wire-grid polarizers, and designed and developed a wire-grid polarizer with a nano-triangular wave-shaped structure that can be fabricated using general-purpose manufacturing equipment. Once the mould is prepared, this polarizer can be fabricated via nanoimprinting and metal deposition with a normal angle or electroless plating processes. The polarizer fabricated through electroless Ni plating achieves a transmittance of 40%, which is approximately 1.4 times higher than that achieved in a previous study using electroless Ni plating on a rectangular structure with the same period. In addition, the polarizer fabricated through normal angle Al deposition operates over a wide range of wavelengths from visible light to near-infrared, and achieves a polarization extinction ratio of 24 dB at a wavelength of 550 nm and a high transmittance of 81%. High-performance polarizers can be obtained through normal-angle deposition using general-purpose equipment in contrast to the oblique-angle deposition method employed in the manufacture of conventional rectangular structure-based wire-grid polarizers, thereby contributing to cost reduction and improved manufacturability.
Wideband Infrared Metal Wire Grating Polarizer Using Holographic Lithography and Lift-off Process

Yinyin Chao,Qian Zhou,Kai Ni,Xinghui Li,Hui Lin

DOI: https://doi.org/10.1117/12.2537779

2019-01-01

Abstract:In this work we design a wire grid polarizer(WGP) with silver nanowire grids on a germanium(Ge) substrate with 550nm period and 200nm thickness double-layer and single-layer wire grids based on FDTD method, which can achieve an average TM transmittance(TMT) over 70% and 48% and an extinction ratio(ER) over 76dB and 32dB respectively in the range of 3~15μm waveband. The photoresist grating was made by the Lloyd’s mirror interferometer interference lithography (IL) systems and the metal silver was deposited by thermal evaporation, which avoid the high cost of electron beam lithography and the difficult process of wet etching or dry etching. The fabrication shows that method is proved to be easy implement in the fabrication of sub-wavelength metal gratings. The experiment results show the polarizer has uniform polarization characteristics in the wide infrared band that the average TMT and ER of the doublelayer polarizer are 72.6% and 27.5dB in 3~15μm with single side antireflection coating. The average TMT and ER of the single-layer polarizer are 59.1% and 25.1dB in 3~15μm.
In-line High Efficient Fiber Polarizer Based on Surface Plasmon

Chun-Hua Dong,Chang-Ling Zou,Xi-Feng Ren,Guang-Can Guo,Fang-Wen Sun

DOI: https://doi.org/10.1063/1.3678591

IF: 4

2012-01-01

Applied Physics Letters

Abstract:An in-line high efficient polarizer, composed of tapered fiber on the Au thin film, is theoretically proposed and experimentally demonstrated. The protocol is based on the high efficient adiabatic conversion of transverse magnetic mode from tapered fiber into surface plasmon (SP) and attenuates quickly in metal film. On the contrary, the transverse electric polarized light is influenced hardly in the whole process. The polarization extinction ratio higher than 500:1 (≈27 dB) is obtained in our experiment. Our demonstration offers a potential way to manipulate the polarization of light in integrated circuit and may inspirit more attention to surface plasmon based devices for polarization controlling.
Low-Loss Broadband Transverse Electric Pass Hybrid Plasmonic Fiber Polarizers Using Metallic Nanomaterials

Xinyue Wang,Jianwei Li,Xingjun Wang,Zhongwei Tan,Ruixuan Chen,Xinwei Deng,Ziyu Wang

DOI: https://doi.org/10.1021/acsami.1c00212

2021-03-17

Abstract:Metals were for decades perceived as devoid of interesting optical properties that could be harnessed for optical components and devices. However, with the development of accurate nanofabrication techniques and precise control over architectural parameters, metals can be structured and characterized on the nanoscale. Metallic plasmonic nanomaterials exhibit a number of unique structural and optical properties, which offer the potential for developing new types of plasmonic devices. Here, we demonstrate a low-loss broadband polarizer based on a hybrid plasmonic fiber structure using metals as polarization-selective absorption materials. The polarization mechanism, design, fabrication, and characteristics of the plasmonic polarizers are investigated theoretically, numerically, and experimentally. The theoretical analysis predicts that the polarization-selective absorption with insensitivity to wavelength enables hybrid plasmonic fibers to function as broadband polarizers. Numerical simulations give the comparison of the polarization-selective absorption of various metallic nanomaterials (Ag, Au, In, Al, Cr) and show that aluminum is regarded as the optimum absorption material for the plasmonic polarizer. Experimental results show that through precise control over geometrical parameters, this device is capable of offering a high polarization extinction ratio (PER) of over 40 dB and a low insertion loss (IL) of less than 1.3 dB in the wavelength region of 810.1–870.0 nm. Compared with commercial birefringent-crystal-fiber polarizers, the plasmonic fiber polarizer has a better PER and IL bandwidth. These merits, combined with a compact and robust configuration, enable the plasmonic polarizer to have great potential in a broad range of applications.The Supporting Information is available free of charge at <a class="ext-link" href="/doi/10.1021/acsami.1c00212?goto=supporting-info">https://pubs.acs.org/doi/10.1021/acsami.1c00212</a>.Derivation of dispersion equations and coupling coefficients; three-dimensional numerical analysis of the polarization-selective absorption of various plasmonic metals (Ag, Au, In, Al, Cr); device fabrication; and summary of experimental results (<a class="ext-link" href="/doi/suppl/10.1021/acsami.1c00212/suppl_file/am1c00212_si_001.pdf">PDF</a>)This article has not yet been cited by other publications.

materials science, multidisciplinary,nanoscience & nanotechnology
High-Efficiency and Polarization-Insensitive Grating Couplers on Thin-Film Lithium Niobate Waveguides

Haoyang Tan,Zhaoyang Chen,Bin Chen,Shiming Gao,Xiaowei Guan

DOI: https://doi.org/10.1364/cleo_at.2024.atu4m.1

2024-01-01

Abstract:We demonstrate polarization-insensitive grating couplers on thin-film lithium niobate waveguides. Inverse optimization method is used and the fabricated couplers exhibit efficiencies of - 6 dB for the TE mode and - 6.5 dB for the TM mode.
Ultra-compact Broadband TM-pass Polarizer Using a Silicon Hybrid Plasmonic Waveguide Grating

Xiaowei Guan,Peipeng Xu,Yaocheng Shi,Daoxin Dai

DOI: https://doi.org/10.1364/acp.2013.ath4a.2

2013-01-01

Abstract:An ultra-compact TM-pass polarizer with a footprint of 0.55 × 3.9 μm2 is demonstrated utilizing a grating with a hybrid plasmonic waveguide. The polarizer has a band > 100 nm for 12 dB extinction ratio.
Low loss, wideband, and high extinction ratio TM polarizer based on subwavelength gratings

Haoyu Wu,Yaohui Sun,Yue Zhou,Mengjia Lu,Guohua Hu,Binfeng Yun,Yiping Cui

DOI: https://doi.org/10.1364/ao.520940

IF: 1.9

2024-04-06

Applied Optics

Abstract:Haoyu Wu, Yaohui Sun, Yue Zhou, Mengjia Lu, Guohua Hu, Binfeng Yun, Yiping Cui We propose a low loss, wideband silicon transverse magnetic (TM) polarizer with high polarization extinction ratio and low reflection based ... [Appl. Opt. 63, 2950-2956 (2024)]

optics
In‐line Fiber‐optical Polarizer with High‐extinction Ratios and Low‐insertion Loss

Xinyue Wang,Wu Chaojun,Ziyu Wang

DOI: https://doi.org/10.1002/mop.24418

IF: 1.311

2009-01-01

Microwave and Optical Technology Letters

Abstract:This letter demonstrated a novel strategy to optimize the extinction ratio and the insertion loss of side-polished fiber-optical polarizers. The polarizer has a portion of the cladding polished away and replaced with only a single layer of thin aluminium film. Extinction rations up to over 22.6 dB/cm and the insertion loss down to 1-2 dB/cm have been realized. (C) 2009 Wiley Periodicals, Inc. Microwave Opt Technol Lett 51: 1763-1765, 2009; Published online in Wiley Interscience (www.interscience.wiley.com). DOI 10.1002/mop.24418
Contact-interference Hybrid lithography: Toward Scalable Fabrication of cross-scale periodic micro structure and demonstration on infrared micro polarizer array

Tianshi Lu,Fuyuan Deng,Yufeng Wei,Zhipeng Zeng,Xinghui Li

2024-10-16

Abstract:Subwavelength grating micro-polarizer arrays, as a type of focal plane division simultaneous detection method, are significantly advancing the development and practical application of polarization imaging technology. Based on the cross-scale, dual-period characteristics of the grating array, this paper proposes a fabrication method that combines laser interference lithography with contact lithography. This method constructs a complete single-layer micro-polarizer array photoresist pattern through a four-step lithography process. Compared to traditional point-by-point fabrication methods like EBL and FIB, the patterning time is reduced by 3 to 4 orders of magnitude. Additionally, by introducing a refractive index matching liquid and an alignment method based on substrate contours, the effects of gaps and splicing errors are minimized, resulting in high-quality photoresist patterns with splicing errors less than 1{\mu}m. Finally, a double-layer metal grating structure was obtained through pattern transfer. Performance tests show that the micro-polarizer array achieves a maximum transmittance of over 50% and an extinction ratio exceeding 15dB in the 3-15{\mu}m wavelength range. This exploration offers a low-cost, high-efficiency path for fabricating micro-polarizer arrays.

Optics
Low Loss, Compact Tm-Pass Polarizer Based on Hybrid Plasmonic Grating

Bowen Bai,Lu Liu,Ruixuan Chen,Zhiping Zhou

DOI: https://doi.org/10.1109/lpt.2017.2663439

IF: 2.6

2017-01-01

IEEE Photonics Technology Letters

Abstract:A low-loss, compact TM-pass polarizer is demonstrated based on hybrid plasmonic grating on silicon-on-insulator platform. Since the large mode distribution mismatch and plasmonic effect significantly influence the transmission and reflection spectrum of the device, the traditional theory of Bragg grating cannot fully explain this phenomenon. Here, we proposed an analysis method which takes effective index and mode overlap together into consideration to design this polarizer. A compact length of 2.5 mu m with extinction ratio over 25 dB is realized simultaneously. Moreover, the insertion loss is only 0.088 dB, which is comparable to dielectric-based devices.
Surface Plasmon-Mediated Transmission in Double-Layer Metallic Grating Polarizers

Zhicheng Ye,Yao Peng,Tianrui Zhai,Ying Zhou,Dahe Liu

DOI: https://doi.org/10.1364/josab.28.000502

2011-01-01

Abstract:We study the mechanism of polarization-selective transmission in double-layer gratings. For TM polarized light, the coupling between the surface plasmon waveguide modes of slits in the two metal layers causes most of the energy to pass the gratings. For TE polarized light, there is no surface plasmon coupling effect, and most of the energy in the photoresist waveguide is reflected back because of the cutoff of waveguide modes. In view of the characteristics of surface plasmon waveguide modes, a new polarizer with an undercut profile of the photoresist is proposed to achieve better performance by improving the coupling efficiency. At the pitch of 200 nm, the TM transmissions can be over 70% in the visible spectrum and over 80% in the wavelengths from 470 nm to 800 nm for a bottom width w(2) < 60 nm. (C) 2011 Optical Society of America
Large-area flexible infrared nanowire grid polarizer fabricated using nanoimprint lithography.

Yuanyi Fan,J. Chu,Xiangwei Zeng,Weidong Kang

DOI: https://doi.org/10.1364/AO.57.005230

IF: 1.9

2018-06-20

Applied Optics

Abstract:We fabricated a 4-in large-area flexible infrared nanowire grid polarizer using a nanoimprint and metal thermal evaporation process. To protect the Si master template, as well as to prolong the service life of it, we first fabricated a nickel template as an alternative by an electroforming process. Then, the nanowire grid structure was transferred from this template to IPS substrate by a thermal nanoimprint process. Finally, Al was deposited on the IPS nanowire structure by vertical thermal evaporation technology. The results of the infrared optical test reveal that the TM transmittance of the polarizer is greater than 60% in the 4-5.71 μm and 5.73-6.7 μm wavelength ranges, and, especially, it is greater than 70% in the wavelength ranges of 4.70-5.69 μm and 5.75-6.59 μm. The extinction ratio is more than 20 dB in the wavelength range of 3.6-6.7 μm, proving that the polarizer has good polarization characteristics. The flexible infrared nanowire grid polarizer has potential applications in the fields of curved surface monitoring equipment and polarized imaging equipment.

Medicine,Engineering,Physics,Materials Science

Fabrication and characterization of high extinction ratio transmission polarizers

Fabrication and characterization of high extinction ratio transmission polarizers

An Integrated Surface Plasmonic TE-Pass Polarizer on a Silica-on-Silicon Waveguide

Fabrication and Characterization of Bilayer Metal Wire-Grid Polarizer Using Nanoimprint Lithography on Flexible Plastic Substrate

Design and Fabrication of a TE-pass Polarizer Based on Silicon Nitride Optical Waveguide

A Study of Nano-Structural Effect on the Polarization Characteristics of Metallic Sub-Wavelength Grating Polarizers in Visible Wavelengths

Optimization Study of Metallic Sub-Wavelength Gratings As the Polarizer in Infrared Wavelengths.

Broadband and Compact TE-Pass Polarizer Based on Hybrid Plasmonic Grating on LNOI Platform

Fabrication of Polarization Independent Gratings Made on Multilayer Dielectric Thin Film Substrates

Development and analysis of a nano-triangular wave-shaped polarizer

Wideband Infrared Metal Wire Grating Polarizer Using Holographic Lithography and Lift-off Process

In-line High Efficient Fiber Polarizer Based on Surface Plasmon

Low-Loss Broadband Transverse Electric Pass Hybrid Plasmonic Fiber Polarizers Using Metallic Nanomaterials

High-Efficiency and Polarization-Insensitive Grating Couplers on Thin-Film Lithium Niobate Waveguides

Ultra-compact Broadband TM-pass Polarizer Using a Silicon Hybrid Plasmonic Waveguide Grating

Low loss, wideband, and high extinction ratio TM polarizer based on subwavelength gratings

In‐line Fiber‐optical Polarizer with High‐extinction Ratios and Low‐insertion Loss

Contact-interference Hybrid lithography: Toward Scalable Fabrication of cross-scale periodic micro structure and demonstration on infrared micro polarizer array

Low Loss, Compact Tm-Pass Polarizer Based on Hybrid Plasmonic Grating

Surface Plasmon-Mediated Transmission in Double-Layer Metallic Grating Polarizers

Large-area flexible infrared nanowire grid polarizer fabricated using nanoimprint lithography.