Fabrication and Characterization of Bilayer Metal Wire-Grid Polarizer Using Nanoimprint Lithography on Flexible Plastic Substrate

Fantao Meng,Gang Luo,Ivan Maximov,Lars Montelius,Jinkui Chu,Hongqi Xu
DOI: https://doi.org/10.1016/j.mee.2011.06.008
IF: 2.3
2011-01-01
Microelectronic Engineering
Abstract:In this work, we demonstrate the fabrication of bilayer metal wire-grid polarizers and the characterization of their performance. The polarizers with 200nm period were fabricated on flexible plastic substrates by nanoimprint lithography (NIL), followed by aluminum deposition. Transmission efficiency over 0.51 and extinction ratio higher than 950 can be achieved in the visible range when the aluminum thickness of the polarizer is 100nm. The fabrication process only involves direct imprinting on flexible plastic substrates and aluminum deposition, without any resist spin-coating, lift-off, and etching processes, which is much simpler, less costly, and applicable to large volume production.
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