Abstract:Abstract Laser processing implies the generation of a material function defined by the shape and the size of the induced structures, being a collective effect of topography, morphology, and structural arrangement. A fundamental dimensional limit in laser processing is set by optical diffraction. Many material functions are yet defined at the micron scale, and laser microprocessing has become a mainstream development trend. Consequently, laser microscale applications have evolved significantly and developed into an industrial grade technology. New opportunities will nevertheless emerge from accessing the nanoscale. Advances in ultrafast laser processing technologies can enable unprecedented resolutions and processed feature sizes, with the prospect to bypass optical and thermal limits. We will review here the mechanisms of laser processing on extreme scales and the optical and material concepts allowing us to confine the energy beyond the optical limits. We will discuss direct focusing approaches, where the use of nonlinear and near-field effects has demonstrated strong capabilities for light confinement. We will argue that the control of material hydrodynamic response is the key to achieve ultimate resolution in laser processing. A specific structuring process couples both optical and material effects, the process of self-organization. We will discuss the newest results in surface and volume self-organization, indicating the dynamic interplay between light and matter evolution. Micron-sized and nanosized features can be combined into novel architectures and arrangements. We equally underline a new dimensional domain in processing accessible now using laser radiation, the sub-100-nm feature size. Potential application fields will be indicated as the structuring sizes approach the effective mean free path of transport phenomena.

Laser interference lithography for nanoscale structuring of materials: From laboratory to industry

High Throughput Laser Nano Direct Writing Technique

Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

Beyond 100 nm Resolution in 3D Laser Lithography: Post Processing Solutions

Photolithography Using Lateral Surface of Nanofibers

Light and Matter Co-Confined Multi-Photon Lithography

Laser Interference Lithography-A Method for the Fabrication of Controlled Periodic Structures

Recent Advances of Laser Interference Lithography

Laser nano-fabrication inside silicon with spatial beam modulation and non-local seeding

Direct Laser Writing Breaking Diffraction Barrier Based on Two-Focus Parallel Peripheral-Photoinhibition Lithography

Design and Simulation of Symmetric Nanostructures Using Two-Beam Modulated Interference Lithography Technique

Surface Nano-fabrication by Laser Precision Engineering

Development and application research of laser interference lithography process

Fabrication of nanostructured hydrophobic surfaces with laser interference lithography

Laser nanofabrication inside silicon with spatial beam modulation and anisotropic seeding

Tailoring Sub-micrometer Periodic Surface Structures via Ultrashort Pulsed Direct Laser Interference Patterning

Superlens-enhanced Laser Interference Lithography

Unconventional Lithography for Patterned Nanomaterials

Advances in ultrafast laser structuring of materials at the nanoscale

Large-Area Plasmonic Structures Fabricated by Laser Nanopatterning and Their Applications

Controllable fabrication of Sub-20nm structures with coupling field tip enhancement effect induced by nanosecond pulsed laser irradiation