Large-Area Plasmonic Structures Fabricated by Laser Nanopatterning and Their Applications

M. H. Hong,C. H. Liu,F. Ma,Z. C. Chen,B. Luk'yanchuk,L. P. Shi,T. C. Chong
DOI: https://doi.org/10.1117/12.810460
2009-01-01
Abstract:Laser interference lithography is applied to fabricate large-area plasmonic nanostructures. This approach has the advantages of being non-contact process in air and able to achieve large-area and maskless nanolithography at a high speed with low system investment. Single layer Au or Ag noble metallic thin film and Ag/Au,Ag/Ni or Au/Ni bimetallic layer thin films are patterned into nano-dot, nano-rod and nano-nut arrays by laser interference lithography. Plasmonic effects of the fabricated metallic nanostructures are studied. Tunable and multi-peak surface plasmon resonances of these nanostructures can be obtained, which have potential applications in solar cells, bio-sensing and photonic circuits.
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