Symmetry Constraint Based on Mismatch Analysis for Analog Layout in SOI Technology

Jiayi Liu,Sheqin Dong,Xianlong Hong,Yibo Wang,Ou He,Satoshi Goto

DOI: https://doi.org/10.1109/aspdac.2008.4484055

2008-01-01

Abstract:The conventional tools for mismatch elimination such as geometric symmetry and common centroid technology can only eliminate systematic mismatch, but can do little to reduce random mismatch and thermal-induced mismatch. As the development of VLSI technology, the random mismatch is becoming more and more serious. And in the context of Silicon on Insulator (SOI), the self-heating effect leads to unbearable thermal-induced mismatch. Therefore, in this paper, we first propose a new model which can estimate the combination effect of both random mismatch and thermal-induced mismatch by mismatch analysis and SPICE simulation. And in order to meet the different sensitivities of different symmetry pairs, an automatic classification tool and a configurable optimization process are also introduced. All of these are embedded in the floorplanning process. The final experimental results prove the effectiveness of our method.