Abstract:The tungsten single crystal has many excellent properties, namely a high melting point, high anti-creeping strength. Chemical vapor transportation deposition (CVTD) is a possible approach to achieve large-sized W single crystals for high-temperature application such as the cathode of a thermionic energy converter. In this work, CVTD W coatings were deposited on the monocrystalline molybdenum substrate (a tube with <111> axial crystalline orientation) using WCl6 as a transport medium. The microstructures of the coatings were investigated by a scanning electron microscope (SEM) and electron backscatter diffraction (EBSD). The as-deposited coatings are hexagonal prisms—rough surfaces perpendicular to <110> with alternating hill-like bulges and pits at the side edges of the prisms, and flat surfaces perpendicular to <112> with arc-shaped terraces at the side faces. This can be explained by two-dimensional nucleation -mediated lateral growth model. Some parts of the coatings contain hillocks of an exotic morphology (noted as “abnormal growth”). The authors hypothesize that the abnormal growth is likely caused by the defects of the Mo substrate, which facilitate W nucleation sites, cause orientation difference, and may even form boundaries in the coatings. A dislocation density of 106 to 107 (counts/cm2) was revealed by an etch-pit method and synchrotron X-ray diffraction. As the depositing temperature rises, the dislocation density decreases, and no sub-boundaries are found on samples deposited over 1300°C, as a result of atom diffusion and dislocation climbing.

Evolution of surface morphology, roughness and texture of tungsten disilicide coatings on tungsten substrate

Investigation of Morphology and Texture Properties of WSi2 Coatings on W Substrate Based on Contact-Mode AFM and EBSD

Influence of Surface Morphology and Microstructure on Performance of CVD Tungsten Coating under Fusion Transient Thermal Loads

Synthesis WSi2 Coating on W Substrate by HDS Method with Various Deposition Times

Effect of Hot Dip Silicon-Plating Temperature on Microstructure Characteristics of Silicide Coating on Tungsten Substrate

Surface morphology and crystal orientation of electrodeposited tungsten coatings with different pulse parameters

Substrate dilution and interface structures of tungsten coating deposited by double-glow plasma surface alloying on stainless steel substrate

Silicide Formation with Tungsten Deposited from W-LPCVD; the Role of Back Surface Conditions

On the Tungsten Single Crystal Coatings Achieved by Chemical Vapor Transportation Deposition

Synergetic Effect of Chemical Components in a Tungsten CMP Slurry and the Evolution of Tungsten Surface Species

Microstructure and Growth Mechanism of Tungsten Carbide Coatings by Atmospheric CVD

Surface, Structural, and Mechanical Properties Enhancement of Cr2O3 and SiO2 Co-Deposited Coatings with W or Be

Surface modification of WC-Co alloy using Al and Si powder through WEDM: A thermal erosion process

The Surface Mapping and Crystal Orientation of Body-Centered Cubic Thin Metal Tungsten Films of Different Thickness

Fabrication and Growth Mechanism of Al-Si Coatings Deposited on Mo Substrate by Hot Dip Plating Technology

Microstructure Evolution of Cobalt Coating Electroless Plated on SiC Whisker During Electroless Plating and Heat Treatment

Microstructure evolution of the W-C hard coatings using directed energy deposition on tungsten alloy surface

Pore Formation Mechanism in W–C Hard Coatings Using Directed Energy Deposition on Tungsten Alloy

Study on W Graded Doping Dlc Composite Films with Multicomponent Transition Layer

Structure, Mechanical and Thermal Properties of TiSiWN Coatings

The Influence of Substrate Doping on Silicide Formation with Tungsten Deposited from Tungsten Hexafluoride