Abstract:At present, a single post-processing technology will always introduce secondary defects (trace pollution elements and structural defects) while removing surface processing defects of fused silica components, which limits the further improvement of the laser damage threshold of the components. Therefore, to effectively remove surface defects in optically-processed fused silica and suppress defect regeneration is the key to improve the laser damage resistance performance of the components. Based on the complementarity of anisotropic ion beam etching and isotropic HF acid etching, a combined etching technology is proposed for fused silica components used in engineering. The combined etching can remove most of the fragmented defects on fused silica surface to achieve relatively good surface quality with a root mean square roughness of 0.666 nm. After the combined etching, the contents of most impurity elements decrease by approximately an order of magnitude. Besides, the contents of the structural defects significantly reduce. Therefore, The zero probability damage threshold and the 100 % probability damage threshold increase by 32.41 % and 57.46 %, respectively. The results show that the combined etching technology can effectively improve the laser damage resistance performance of fused silica components, especially under high fluence laser irradiation, which is very important for the high power output and stable operation of laser facilities.

Combined non-destructive evaluation of the damage precursors in fused silica optics

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics

Research on the mitigation of redeposition defects on the fused silica surface during wet etching process

Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics

Development of Integrated Multi-Station System to Precisely Detect and Mitigate Surface Damage on Fused Silica Optics

Evolution mechanism of subsurface damage during laser machining process of fused silica

Influence of bulk defects on bulk damage performance of fused silica optics at 355 nm nanosecond pulse laser

Damage Behaviors of Silica Microparticles on Fused Silica Optics under 355 Nm High Fluence Laser

Self-focusing and stimulated Brillouin scattering effect of low-temporal coherence light and corresponding damage characteristics in fused silica

Investigation on Hybrid Laser Ablation and Its Application in Fused Silica Damage Mitigation.

Strong UV laser absorption source near 355 nm in fused silica and its origination

Combining laser-induced fluorescence and light-scattering microscopies to diagnose low-fluence damage precursors on KDP-based crystal surface

Non-destructive testing of subsurface damage for early indication of laser-induced damage threshold in fused silica

Detection of surface defects and subsurface defects of polished optics with multisensor image fusion

Combined Etching Technology for Controlling Surface Damage Precursors to Improve Laser Damage Resistance of Fused Silica

Correlation Between Photoluminescence Properties of Surface Defects and Laser-Induced Damage Threshold of Fused Silica

Experimental Investigation of Subsurface Damage Depth of Lapped Optics by Fluorescent Method

Characterization of 355 Nm Laser-Induced Damage of Mitigated Damage Sites in Fused Silica

Research on Laser-Induced Damage Post-Restoration Morphology of Fused Silica and Optimization of Patterned CO2 Laser Repair Strategy

Experimental investigation and numerical simulation of defect elimination by CO2 laser raster scanning on fused silica