The capacitance/conductance and surface state intensity characteristics of the Al/(CMAT)/p-Si structures

H.G. Çetinkaya,Seda Bengi,O. Sevgili,Şemsettin Altındal
DOI: https://doi.org/10.1088/1402-4896/ad1c2b
2024-01-10
Physica Scripta
Abstract:To determine the Al/(CMAT)/p-Si structure's admittance analysis, capacitance/conductance versus frequency (C/G-V-f) data was obtained in the 3 kHz-3 MHz and -2/4V ranges at room temperature. From the Nicollian and Brews method, voltage-dependent spectra of Rs were derived for various frequencies. The parallel conductance and low-high frequency capacitance (CLF-CHF) techniques, respectively, were used to determine the voltage and frequency dependent spectra of Nss and their life time (τ). Surface states (Nss), which are identified by admittance measurements, emerge at the M/S interlayer as a result of high capacitance and conductance values at low frequencies. This can also be explained by the Nss's ability to track ac signals well at lower frequencies. The normalized parallel conductance versus frequency (Gp/ω-f) plot under various biases show a peak as a result of Nss existence. X-ray diffractometer (XRD) was used for structural investigation.
physics, multidisciplinary
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