Effect of low-temperature interlayer in active-region upon photoluminescence in multiple-quantum-well InGaN/GaN

Rui Li,Chengxin Wang,Kaiju Shi,Changfu Li,Shangda Qu,Xiangang Xu,Ziwu Ji
DOI: https://doi.org/10.1016/j.jlumin.2022.118741
IF: 3.6
2022-04-01
Journal of Luminescence
Abstract:Photoluminescence (PL) spectra dependent on the excitation power and temperature of two different red-emitting InGaN/GaN trapezoidal multiple quantum wells (TMQWs), with GaN and AlN low-temperature interlayers (LTILs) between the InGaN well and GaN barrier layers, were investigated. It was found that compared with the TMQWs with GaN LTILs, the TMQWs with AlN LTILs have a better structural quality, more significant carrier-localizing effect, and superior internal quantum efficiency. The results can be explained by the fact that due to the stability of Al–N bond and strain-compensated effect of AlN, compared with the GaN LTIL, the AlN LTIL grown on the InGaN well layer with embedded In-rich quantum dots (QDs), cannot only reduce threading dislocation densities as confirmed by XRC measurements, but also prevent In atoms from diffusing from In-rich QDs to InGaN matrix and/or from the InGaN well to GaN barrier layer, thus suppressing degradation of the QDs and generation of non-radiative centers.
optics
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