Design and fabrication of a differential pressure MEMS capacitance diaphragm gauge based on heavily boron-doping technique

Xin Ke,Gang Li,Xiaodong Han,Yongjun Cheng,Wenjun Sun,Mahui Xu,Huiying Chen,Chenxi Zhao,Detian Li
DOI: https://doi.org/10.1016/j.vacuum.2020.109880
IF: 4
2021-02-01
Vacuum
Abstract:<p>In this paper, a differential pressure MEMS CDG with a full range of (5–4000) Pa has been developed, and its pressure-sensing diaphragm is manufactured by boron-doping technique. The design principle and manufacturing process of the MEMS CDG were demonstrated in detail. To test the working performance of the CDG, a differential pressure high vacuum pumping system and a precision LCR meter are adopted to obtain the capacitance value of the vacuum gauge varying with pressure. The test results show that the MEMS CDG can work normally in the pressure range of (5–4000) Pa, and the maximum sensitivity is 87.2 fF/Pa. In addition, boron-doped diaphragm can effectively improve the sensitivity of vacuum gauge and further extend its measurement upper limit.</p>
materials science, multidisciplinary,physics, applied
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