Thermal stability of structure, microstructure and enhanced properties of Zr–Ta–O films with a low and high Ta content

Š. Zuzjaková,P. Zeman,S. Haviar,R. Čerstvý,J. Houška,J. Rezek,J. Vlček
DOI: https://doi.org/10.1016/j.surfcoat.2017.12.026
IF: 4.865
2018-02-01
Surface and Coatings Technology
Abstract:The paper reports on the thermal stability of two ternary Zr–Ta–O films (Zr25Ta5O70, Ta25Zr5O70) and two binary oxide films (ZrO2, Ta2O5) prepared by reactive high-power impulse magnetron sputtering using a pulsed reactive gas flow control. The thermal stability of the structure, microstructure, mechanical and optical properties of the films was investigated in air in the temperature range of 650°C – 1300°C. It was found that both ternary Zr–Ta–O films investigated exhibit an enhanced thermal stability of the as-deposited structure and enhanced properties compared to the corresponding binary oxides. The Zr25Ta5O70 film is a single-phase material with a nanocrystalline structure corresponding to the TaZr2.75O8 phase. This phase is stable up to the maximum temperature investigated (1300°C) and the film retains a high hardness (19GPa) and refractive index (2.25) even after the annealing to 1000°C in air. The Ta25Zr5O70 film exhibits an amorphous structure in the as-deposited state with its thermal stability up to 800°C, which is about 100°C more than for the Ta2O5 film.
physics, applied,materials science, coatings & films
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