Abstract:In this paper, we introduce a flexible and simple system calibration method for specular surface metrology based on the combination of reflection rays determined by the varied points on a screen and reflection images of a plane mirror without fiducials placed at three different locations. This calibration procedure involves three steps. The camera is first calibrated based on plane patterns. Then the reflection ray directions are measured via correspondence matching. The last calibration step is the pose estimation by the orthogonal iteration algorithm and reflections in a plane mirror. Basically, the concept of replacing the coordinates of the camera center with the reflection ray can alleviate the trouble of imaging aberration. Then global optimization can be operated with the orthogonal projection defined by the reflection ray, providing precise initial values for the process of bundle adjustment, compared to the classical calibration approach directly using the local optimization algorithm. Simulations and experiments both demonstrate the validity, efficiency, and robustness of the proposed improved method. In the simulations, the proposed method achieves the absolute errors of the camera parameters within 3 pixels and the relative errors of the screen pose are below 0.5% when the noise level is 0.6 pixel. Furthermore, the calibration method shows strong anti-noise ability, relying on the application of the reflection rays and the global optimization before the final bundle adjustment. In addition, the reconstruction accuracy in our experiment improves by 60.11% by the proposed method compared with the calibration procedure, which only utilizes the bundle adjustment optimization. In general, this novel calibration method can make the measurement achieve high accuracy and robustness at a low cost and with a simple setup, providing an efficient, economical, and flexible approach for a phase measuring deflectometry system in practical situations.

Stitching interferometry for long X-ray mirrors with lateral multi-shift-based absolute calibration

Stitching interferometry using alternating calibration of positioning and systematic errors

Influence of Alignment Error and Random Noise on Interferometry Flat Sub-Aperture Stitching

Analysis on mirrors installation error of high-accuracy long focal length measurement system

Scanning Interferometric Method for Measuring Group Delay of Dispersive Mirrors

Elimination of reference surface error on high-accuracy subaperture stitching

Stitching Interferometry for Synchrotron Mirror Metrology at National Synchrotron Light Source II (NSLS-II)

Design and Testing of a Compact Non-Orthogonal Two-Axis Lloyd's Mirror Interferometer for Fabrication of Large-Area Two-Dimensional Scale Gratings

One-dimensional Stitching Interferometry Assisted by a Triple-Beam Interferometer.

Subaperture moving strategy and related systematic errors in stitching interferometry of X-ray mirrors

Self-calibration of Fizeau interferometer and planar scale gratings in Littrow setup.

In Situ Metrology for Adaptive X-Ray Optics with an Absolute Distance Measuring Sensor Array

Stitching interferometry using Computer-Generated Hologram (CGH) based on sub-aperture adjustment aberration of 2-D Chebyshev polynomial

Lateral Location Error Compensation Algorithm for Measuring Aspheric Surfaces by Sub-Aperture Stitching Interferometry

Repeatability Analysis of One-Dimensional Angular-Measurement-based Stitching Interferometry.

Two-dimensional Stitching Interferometry Based on Tilt Measurement.

Measurement of Straightness Without Abbe Error Using an Enhanced Differential Plane Mirror Interferometer

Improved System Calibration for Specular Surface Measurement by Using Reflections from a Plane Mirror.

Research on Confocal and Co-Phasing Adjustments of Optical Mirrors by a Six-DOF Cross-Scale Piezoelectric Platform

Automatic measurement system for large-aperture-angle non-holonomic spherical stitching with laser differential confocal interference

Sub-aperture Stitching Interference Measurement Method Based on Marker Location and Global Optimization