Optimizing Josephson Junction Reproducibility in 30 kV E-beam Lithography: Analysis of Backscattered Electron Distribution

A. M. Rebello,L. M. Ruela,G. Moreto,N. Y. Klein,E. Martins,I. S. Oliveira,F. Rouxinol,J. P. Sinnecker
2024-03-29
Abstract:This paper explores methods to enhance the reproducibility of Josephson junctions, crucial elements in superconducting quantum technologies, when employing the Dolan technique in 30 kV e-beam processes. The study explores the influence of dose distribution along the bridge area on reproducibility, addressing challenges related to fabrication sensitivity. Experimental methods include E-beam lithography, with electron trajectory simulations shedding light on backscattered electron behavior. We demonstrate the fabrication of different junction geometries, revealing that some geometries significantly improve reproducibility by resulting in a more homogeneous dose distribution over the junction area.
Quantum Physics,Materials Science,Superconductivity
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