Josephson Junctions Via Anodization of Epitaxial Al on an InAs Heterostructure

A. Jouan,J. D. S. Witt,G. C. Gardner,C. Thomas,T. Lindemann,S. Gronin,M. J. Manfra,D. J. Reilly
DOI: https://doi.org/10.1063/5.0060757
2021-05-24
Abstract:We combine electron beam lithography and masked anodization of epitaxial aluminium to define tunnel junctions via selective oxidation, alleviating the need for wet-etch processing or direct deposition of dielectric materials. Applying this technique to define Josephson junctions in proximity induced superconducting Al-InAs heterostructures, we observe multiple Andreev reflections in transport experiments, indicative of a high quality junction. We further compare the mobility and density of Hall-bars defined via wet etching and anodization. These results may find utility in uncovering new fabrication approaches to junction-based qubit platforms.
Superconductivity,Mesoscale and Nanoscale Physics,Materials Science
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