Electrostatic potential mapping at ferroelectric domain walls by low-temperature photoemission electron microscopy

J. Schaab,K. Shapovalov,P. Schoenherr,J. Hackl,M. I. Khan,M. Hentschel,Z. Yan,E. Bourret,C. M. Schneider,S. Nemsák,M. Stengel,A. Cano,D. Meier
DOI: https://doi.org/10.1063/1.5117881
2020-01-15
Abstract:Low-temperature X-ray photoemission electron microscopy (X-PEEM) is used to measure the electric potential at domain walls in improper ferroelectric Er0.99Ca0.01MnO3. By combining X-PEEM with scanning probe microscopy and theory, we develop a model that relates the detected X-PEEM contrast to the emergence of uncompensated bound charges, explaining the image formation based on intrinsic electronic domain-wall properties. In contrast to previously applied low-temperature electrostatic force microscopy (EFM), X-PEEM readily distinguishes between positive and negative bound charges at domain walls. Our study introduces an X-PEEM based approach for low-temperature electrostatic potential mapping, facilitating nanoscale spatial resolution and data acquisition times in the order of 0.1-1 sec.
Materials Science
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