An in-depth Analysis of the Physical Characteristics of TiO2–CuO Films Fabricated via Spray Pyrolysis

Yassar Arfat,S. V. A. V. Prasad,Santosh Chackrabarti,R. A. Zargar,Vipin Kumar
DOI: https://doi.org/10.1134/s1063782624600931
IF: 0.66
2024-12-07
Semiconductors
Abstract:A composite film of TiO 2 –CuO synthesized by spray pyrolysis is deposited onto a silicon (Si) substrate and subjected to comprehensive characterization using diverse analytical techniques. X-ray diffraction (XRD) revealed the presence of an anatase phase of TiO 2 and a monoclinic phase of CuO, with the highest diffraction occurring on the (101) plane. Raman spectra also depict anatase phase of TiO 2 . The scanning electron microscope (SEM) image reveals a porous and rough morphology whereas EDX depicts the inclusion of CuO. While UV–Visible diffused reflectance indicates a direct band gap of 3.21 eV. Similarly, photoluminescence (PL) studies reveal a significant reduction in intensity within the UV and blue regions as compared to the yellow region. Likewise, the ideality factor ( n ) and barrier height (Φ b ), which are diode parameters are computed based on the I – V characteristics. These findings suggest that the TiO 2 –CuO film holds potential for applications in the manufacturing of optoelectronic devices.
physics, condensed matter
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