Defect detection in nano-scale transistors based on radio-frequency reflectometry

B. J. Villis,A. O. Orlov,X. Jehl,G. L. Snider,P. Fay,M. Sanquer
DOI: https://doi.org/10.1063/1.3647555
2011-09-21
Abstract:Radio-frequency reflectometry in silicon single-electron transistors (SETs) is presented. At low temperatures (<4 K), in addition to the expected Coulomb blockade features associated with charging of the SET dot, quasi-periodic oscillations are observed that persist in the fully depleted regime where the SET dot is completely empty. A model, confirmed by simulations, indicates that these oscillations originate from charging of an unintended floating gate located in the heavily doped polycrystalline silicon gate stack. The technique used in this experiment can be applied for detailed spectroscopy of various charge defects in nanoscale SETs and field effect transistors
Mesoscale and Nanoscale Physics
What problem does this paper attempt to address?
### Problems the paper attempts to solve This paper aims to solve the problem of defect detection in nano - scale transistors, especially using radio - frequency reflectometry (RF reflectometry) technology to detect charge defects in single - electron transistors (SETs). Specifically, the author focuses on the quasi - periodic oscillation phenomenon observed in the fully depleted region of single - electron transistors (i.e., the state where the SET point is completely empty) under low - temperature conditions (<4K). These oscillations are not caused by the Coulomb blockade effect of the SET itself, but by the charging effect of a floating gate (FG) accidentally formed in the polysilicon gate stack. #### Main problems and challenges 1. **Random background charge problem**: One of the main obstacles to large - scale integration of single - electron transistors is the existence of random background charges, which can lead to unpredictable changes in the device threshold voltage. 2. **Defect detection technology**: Existing research mainly focuses on the influence of low - frequency conduction or noise on SETs, while this paper proposes a new method, that is, using radio - frequency reflectometry to study charge defects in nano - scale transistors in detail. 3. **Floating - gate effect**: In the polysilicon gate structure, due to material properties (such as twins and grain boundaries), part of the gate area may form a floating gate, resulting in additional charging effects. These effects are particularly significant at low temperatures and can be detected by radio - frequency reflectometry technology. ### Solutions The author verifies through experiments and simulations that these quasi - periodic oscillations originate from the floating - gate charging effect in the polysilicon gate. They use a radio - frequency reflectometry device based on an in - phase detector, combined with a resonant circuit in a low - temperature environment, and successfully detect these oscillations. In addition, the author also proposes a model to explain the physical mechanism of these oscillations and confirms the validity of this model through numerical simulation. ### Significance and applications This research not only reveals the charging effect of the floating gate in the polysilicon gate, but also shows the potential of radio - frequency reflectometry technology in defect detection of nano - scale transistors. This technology can be used to characterize various charge defects in detail, which is helpful to improve the performance and reliability of microelectronic devices, especially in the applications of high - dielectric - constant materials and advanced gate stacks. ### Formula summary - Reflection coefficient formula: \[ \Gamma=\left|\frac{Z - Z_0}{Z + Z_0}\right| \] where \(Z_0 = 50\Omega\) is the characteristic impedance of the transmission line. - Capacitance relationship of single - electron charging system: \[ C_{FG - \text{SET}}=23\text{aF}, \quad C_{FG - g}=200\text{aF}, \quad C_{FG - s}=C_{FG - d}=30\text{aF} \] - Slope formula: \[ \frac{dV_d}{dV_g}=\frac{C_{FG - \text{source}}+C_{FG - \text{drain}}}{C_{FG - \text{drain}}}\geq1 \] When \(C_{FG - \text{source}}=C_{FG - \text{drain}}\), the slope is 2. Through these research results, the author provides a new and effective tool for defect detection of nano - scale transistors and provides a theoretical basis for further optimizing the design of microelectronic devices.