Abstract:The dynamic effects, such as the steering and the screening effects during deposition, on an epitaxial growth (Cu/Cu(001)), is studied by kinetic Monte Carlo simulation that incorporates molecular dynamic simulation to rigorously take the interaction of the deposited atom with the substrate atoms into account. We find three characteristic features of the surface morphology developed by grazing angle deposition: (1) enhanced surface roughness, (2) asymmetric mound, and (3) asymmetric slopes of mound sides. Regarding their dependence on both deposition angle and substrate temperature, a reasonable agreement of the simulated results with the previous experimental ones is found. The characteristic growth features by grazing angle deposition are mainly caused by the inhomogeneous deposition flux due to the steering and screening effects, where the steering effects play the major role rather than the screening effects. Newly observed in the present simulation is that the side of mound in each direction is composed of various facets instead of all being in one selected mound angle even if the slope selection is attained, and that the slope selection does not necessarily mean the facet selection.

What problem does this paper attempt to address?

The problem that this paper attempts to solve is to explore the influence of deposition dynamics (such as the deflection effect and the shielding effect) on thin - film growth during atomic layer deposition, especially under glancing - angle deposition conditions. Specifically, the author hopes to study how these dynamic effects influence the epitaxial growth of copper (Cu) on a Cu(001) substrate by combining molecular dynamics (MD) simulations and Monte Carlo (KMC) simulations. ### Research Background and Problems 1. **Increased Surface Roughness**: Glancing - angle deposition leads to a significant increase in surface roughness. 2. **Asymmetric Hill - like Structures**: The formed hill - like structures are asymmetric, especially the slope along the deposition direction is steeper than the slope away from the deposition direction. 3. **Slope Characteristics in Different Directions**: Different sides of the hill - like structures are composed of multiple local crystal planes rather than a single - angle crystal plane. ### Importance of Dynamic Effects Previous studies usually ignored the dynamic parameters of atoms during the deposition process, while this paper emphasizes the important influence of these parameters on thin - film growth. By introducing the deflection effect (steering effect) and the shielding effect (screening effect), the author explains why glancing - angle deposition leads to the above - mentioned characteristics and verifies the rationality of these effects in experiments. ### Main Findings - **Deflection Effect is Dominant**: The study found that the deflection effect plays a major role in causing non - uniform deposition flux, thus leading to changes in surface morphology. - **Coexistence of Multiple Crystal Planes**: Even when slope selection is achieved, the sides of the hill - like structures are also composed of multiple local crystal planes rather than a single - angle crystal plane. - **Temperature Dependence**: Temperature has a significant impact on the morphology of the hill - like structures, especially in the high - temperature and low - temperature regions, and the asymmetry of the hill - like structures is more obvious. ### Summary By combining MD and KMC simulations, this paper reveals the important influence of deposition dynamics (especially the deflection effect) on the Cu/Cu(001) epitaxial growth process. The research results not only explain the phenomena observed in experiments but also provide a theoretical basis for understanding similar phenomena in other material systems.

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