Spurious Mode Free 3.5GHz AlN Plate Mode Resonator with High FoM

Nan Wang,Yao Zhu,Geng LiChua,Bangtao Chen,M. Srinivas,Navab Singh,Y. Gu
DOI: https://doi.org/10.1109/ULTSYM.2018.8579970
2018-10-01
IUS
Abstract:This work reports a spurious mode free AlN plate mode resonator with high figure-of-merit (FoM) operating at 3.5GHz. The reported resonator, which comprises of two sets of <tex>$0.27\ \mu \text{m}$</tex>-thick top molybdenum (Mo) interdigitated electrodes (IDE) fingers attached to a layer of <tex>$1\ \mu \text{m}$</tex>-thick AlN, has an IDE pitch <tex>$(p)$</tex> of 1m and a finger width <tex>$(w)$</tex> of <tex>$0.5\ \mu \text{m}$</tex> defined by optical photolithography. Besides reducing the fabrication process complexity, having only IDE on the top surface of AlN in the fabrication process also increases the acoustic phase velocity <tex>$(v_{p})$</tex> as a result of the exclusion of bottom Mo IDE which has a lower acoustic phase velocity than AlN, thus relaxing the lithographic and etching requirement of IDE pitch. Measurement results show that the resonant frequency <tex>$(f)$</tex> is around 3.5GHz, with a spurious mode free frequency response over a 1GHz frequency range from <tex>$3GHz$</tex> to <tex>$4\text{GHz}$</tex>. The effective electromechanical coupling coefficient <tex>$(k_{eff^{2}})$</tex> is 3.15% and the Q factor <tex>$(Q)$</tex> is 1000, yielding an <tex>$f\cdot Q$</tex> product of <tex>$3.5\times 10^{12}$</tex> and <tex>$k_{eff^{2}}\cdot Q$</tex> of 31.5, respectively. Together with the series resistance of <tex>$3.11\Omega$</tex> and the parallel resistance of <tex>$874\Omega$</tex>, the proposed plate mode resonator is a promising candidate for mobile Band 42 applications.
Physics
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