Glancing angle fabricated Au/ZrO2 nanoparticles based device for non‐volatile capacitive memory application

Rahul Raman,Amitabha Nath,Mitra Barun Sarkar
DOI: https://doi.org/10.1007/s10854-024-12780-5
2024-05-28
Journal of Materials Science Materials in Electronics
Abstract:The effect of structural modulations on non-volatile capacitive memory devices is reported in this paper. The synthesis of zirconium dioxide (ZrO 2 ) thin film (TF) was done using an electron beam evaporation technique. The glancing angle deposition (GLAD) was used to create ZrO 2 nanoparticles (NP) inside an electron beam evaporator. The formation of ZrO 2 TF and ZrO 2 NP over the silicon (Si) substrate is perceptible using field emission scanning electron microscopy (FESEM). The incorporation of ZrO 2 NP leads to an increase in absorptions (ultra-violet/UV: 5.4 fold and visible: 7.2 fold) and a decrease in corresponding bandgaps due to the oxygen-related vacancies. Gold (Au) electrodes were deposited to fabricate the two distinct devices viz., Au/ZrO 2 TF and Au/ZrO 2 NP. The modulation in leakage current of 0.28 × 10 −1 A at + 5.2 V, an increment of frequency dispersion of 1.6 nF, a maximum conductance value of 7.9 μS, and a higher interface trap state density value of 56.30 × 10 12  cm ‒1  eV ‒1 was attributed the addition of oxygen vacancy related defect states in the Au/ZrO 2 NP than the Au/ZrO 2 TF based devices. The Au/ZrO 2 NP based device shows a high capacitive memory window of 3.53 V at ± 8 V, higher charge storage capability, good endurance as well as good retention properties due to the efficient charge trapping phenomenon. All findings establish a superior and scalable platform for next‒generation non‒volatile memory applications.
engineering, electrical & electronic,materials science, multidisciplinary,physics, condensed matter, applied
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