Performance improvement in reservoir computing by using HfZrO2 FeFETs through operating voltage optimization

Shin-Yi Min,Kasidit Toprasertpong,Eishin Nako,Ryosho Nakane,Mitsuru Takenaka,Shinichi Takagi
DOI: https://doi.org/10.35848/1347-4065/ad2133
IF: 1.5
2024-02-15
Japanese Journal of Applied Physics
Abstract:We have investigated how the parameters of an input gate voltage (Vg) waveform and a drain voltage (Vd) impact the performance of reservoir computing (RC) using a Hf0.5Zr0.5O2 ferroelectric FET (FeFET). The RC performance is maximized by the high swing amplitude of the Vg and the most symmetrical polarization switching condition in the triangular-shaped input waveform, obtained by the center Vg of 0.5 V, because of the enhanced polarization switching of the FeFETs. Regarding the Vd dependence, the amount of the drain current and polarization switching have a trade-off relationship. As a result, a moderate Vd of 1.0 V becomes optimum in terms of the RC performance because a difference in drain current responses between different gate input patterns is maximized with this Vd. Furthermore, high computing capacities are achieved by combining the above optimal bias condition with drain current responses to both original and inverted gate input patterns.
physics, applied
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