Abstract:The microstructure and electrical–optical properties of Al-doped ZnO (AZO) films have been studied as a function of H2 flux in the magnetron sputtering process at 150 °C and postannealing temperature in vacuum. As H2 flux increases in the sputtering gas, the AZO films deposited have a (002) preferred orientation rather than the mixed (100) and (002) orientations, the grain size shows a tendency to first increase then decrease, and (002) diffraction peak position is inclined to shift to higher angles first then to lower angles. The resistivity of the films first decreases then increases with H2 flux, and the lowest resistivity of 4.02 × 10−4 Ω cm is obtained at a H2 flux of 10 sccm. The average transmittance in the visible region shows little dependence on H2 flux. As a whole, the AZO films with higher values of figure of merit are obtained when the H2 flux is in the range of 6–12 sccm. The AZO films deposited in Ar and Ar + H2 exhibit different annealing behaviors. For the AZO film deposited in Ar, the grain size gradually increases, the stresses are relaxed, the resistivity first decreases then increases, and the average transmittance in the visible region is unchanged initially then somewhat decreased as annealing temperature is increased. The optimum annealing temperature for improving properties of AZO films deposited in Ar is 300 °C. For the AZO films deposited in Ar + H2, annealing does not significantly change the microstructure but increases the resistivity of the films; the average transmittance in the visible region remains unchanged initially but greatly reduced with further increase in annealing temperature. The carrier transport in the as-deposited and annealed films appears to be controlled by a mechanism of grain boundary scattering, and the value of Eg increases with the increase in carrier concentration due to Burstein–Moss effect.

Study the characterization of ZnO and AZO films prepared by spray pyrolysis and the effect of annealing temperature

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Preparation and Characterization of Na-doped ZnO Thin Films by Sol–gel Method

Effect of Boron-doping and annealing on the structure, morphological and optical properties of ZnO films prepared by spray pyrolysis method

Effect of annealing temperature onto physical properties of Cu doped ZnO thin films prepared using spray pyrolysis

Characteristics of ZnO Films Prepared by Ultrasonic Spray Pyrolysis Method

The investigation of structural, surface topography, and optical behaviors of Al-doped ZnO thin films with annealing temperature deposited by RF magnetron sputtering

Preparation of highly transparent conductive Al-doped ZnO thin films and annealing effects on properties

Characteristics of Al-doped ZnO Thin Films Prepared in Ar + H2 Atmosphere and Their Vacuum Annealing Behavior

Effects of Annealing Temperature on Crystal Quality and Photoelectric Properties of Al-Doped ZnO Thin Film

Effect of annealing on the structural, topographical and optical properties of sol gel derived ZnO and AZO thin films

Thermal annealing effect on optical properties of electrodeposited ZnO thin films

Influence of Deposition Temperature on the Crystallinity of Al-doped ZnO Thin Films at Glass Substrates Prepared by RF Magnetron Sputtering Method

Study on Aluminum Concentration on Optical and Electrical Properties of AZO Thin Films Fabricated by Ultrasonic Spray Pyrolysis

Preparation and optical characteristics of ZnO films by chelating sol-gel method

Elaboration and Characterization of Mg-Doped ZnO Thin Films by Thermal Evaporation: Annealing Temperature Effect

Effect of annealing on photoluminescence of ZnO:Al thin films prepared by sol-gel method

Effects of annealing temperature on the structural and optical properties of ZnO thin films prepared by sol-gel method

The Effect of Annealing Temperature on the Properties of ZnO Films with Preferential Nonpolar Plane Orientation by SSCVD

[Effects of Annealing Temperature on the Structure and Optical Properties of ZnMgO Films Prepared by Atom Layer Deposition].

Effect of Deposition Temperature on Morphological, Optical, and Photocatalytic Properties of ZnO Thin Films Synthesized by Ultrasonic Spray Pyrolysis Method