Optical analysis of III-nitride micro-light-emitting diodes with different sidewall treatments at low current density operation

Matthew S. Wong,Stephen Gee,Tanay Tak,Srinivas Gandrothula,Steve Rebollo,NamGoo Cha,James S. Speck,Steven P. Denbaars
DOI: https://doi.org/10.35848/1347-4065/ad3790
IF: 1.5
2024-03-25
Japanese Journal of Applied Physics
Abstract:Abstract In this work, the optical efficiency of III-nitride blue micro-light-emitting diodes (μLEDs) ranged from 5×5 μm2 to 60×60 μm2 with different sidewall treatments at low current density range was investigated. The results showed dielectric sidewall passivation using atomic layer deposition (ALD) has superior optical enhancement compared to conventional radio-frequency sputtering, where most of the enhancement occurred at low current density range. Additionally, the use of ALD sidewall passivation and chemical treatment offered significant efficiency improvement for different sizes of μLEDs at operating less than 1 A/cm2 and the devices without sidewall treatments did not emit light. The effect of sidewall treatments to the effective Shockley-Read-Hall (SRH) nonradiative recombination coefficient, or the effective A coefficient from the ABC model, was estimated. The effective SRH nonradiative recombination coefficient was suppressed by two orders of magnitude for devices with sidewall treatments compared to devices without sidewall passivation.
physics, applied
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