Abstract:Abstract Advances in femtosecond laser-material interaction facilitate the extension of maskless optical processing to the high efficiency and deep-subwavelength scale. Here, a hybrid plasmon lithography technique has been demonstrated by irradiating near-infrared femtosecond laser pulses onto the Si material coated with thin Cr films in a vacuum chamber, and superior nanograting structures are found to deeply penetrate through the thin Cr film into the underlying Si substrate. In stark contrast to the common ripple structures formed on the Si surface, the Cr-layer mediated Si nanograting structures not only exhibit the spatially super-regular arrangements with a deep-subwavelength period of 355 nm but also present the nonsinusoidal sharp-edged groove geometry with a large depth-to-width aspect ratio of 2.1. Theoretical analyses and calculations reveal that the anomalous structure characterizations are physically ascribed to the excitation of dual-interface coupled plasmons in the thin metal layer, which possess the squeezed spatial wavelength and the periodic columnar intensity distributions. Moreover, the further deepening of periodic nanostructures into the Si substrate is also elucidated by the simulation of electric field enhancements at the bottom of shallow grooves under irradiation of subsequent laser pulses. In combination with a wet etching process, the Si nanograting structures can be modified into the smooth and narrow-mouthed V -profiles, whose optical measurements show a near omnidirectional antireflection especially in the visible range of 565–750 nm, which is expected for the design of advanced photonic devices.

Nanoscale control of non-reciprocal ripple writing

Sub-diffraction Optical Beam Lithography Based on a Center-Non-zero Depletion Laser

Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

High Throughput Laser Nano Direct Writing Technique

High-throughput and Parallel Direct Laser Writing System Based on Screen Division Multiplexing of Spatial Light Modulator

Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

Laser Direct Writing Using Submicron-Diameter Fibers.

Subwavelength-resolution Direct Writing Using Submicron-Diameter Fibers

Optical Vortex Beam Direct-Writing Photolithography

The double edged sword of femtosecond laser induced periodic surface structures for sub diffraction and high efficient nanotexturing

Laser Direct Writing of Graphene Nanostructures Beyond the Diffraction Limit by Graphene Oxidation

Controllable Fabrication of Super-Resolution Nanocrater Arrays by Laser Direct Writing.

Controllable Micro/Nano Structure Surface Fabricated by Femtosecond Laser and Its Applications

Sub-wavelength Ripple Formation on Silicon Induced by Femtosecond Laser Radiation

Nanoscale reshaping of resonant dielectric microstructures by light-driven explosions

Direct Writing of 150 Nm Gratings and Squares on ZnO Crystal in Water by Using 800 Nm Femtosecond Laser

Controllable fabrication of Sub-20nm structures with coupling field tip enhancement effect induced by nanosecond pulsed laser irradiation

Super-regular femtosecond laser nanolithography based on dual-interface plasmons coupling

Manipulation of Cross-Linked Micro/nanopatterns on ZnO by Adjusting the Femtosecond-Laser Polarizations of Four-Beam Interference

Laser‐Induced Reversible and Irreversible Surface Nanostructuring

Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification