High-throughput and Parallel Direct Laser Writing System Based on Screen Division Multiplexing of Spatial Light Modulator

Jisen Wen,Chenliang Ding,Dazhao Zhu,Liang Xu,Cuifang Kuang,Xu Liu
DOI: https://doi.org/10.1117/12.2638237
2022-01-01
Abstract:Direct laser writing technology has potential applications in the fabrication of micro and nanostructures such as photonic crystals and photonic chips. However, current single-channel direct laser writing systems are mainly limited to low-flux systems, which have disadvantages such as low direct writing efficiency and slow writing speed. To overcome the limitations, we proposed a method based on screen division multiplexing of the spatial light modulator to parallelly fabricate the nanostructures. The spatial light modulator is divided into two parts to achieve a single column of 20 beams array. After optimizing the uniformity of the 20-beam, a 20-channel high-throughput parallel laser direct writing is thus achieved. This scheme directly writes repetitive patterns by an order of magnitude faster than single-beam laser direct writing, which greatly improves the speed of laser direct writing and has important applications in the direct writing of large-area repetitive devices.
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